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TONSON TECH AUTOMATION EOUMPETN CO., LTD.
400-099-0586
Home Products Vacuum plasma systems Middle-large size 30L Industrial vacuum plasma

30L Industrial vacuum plasma

Item NO:TS-PL30

Product introduction: Industrial vacuum plasma cleaning machine

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Product Introduction


This equipment is mainly used to deal with all kinds of special-shaped parts. It has the characteristics of flexible and controllable process parameters and low temperature. It is used for plasma cleaning, etching, coating and surface modification.


Specification


Item NO. TS-PL30
Power Frequency 40KHz/13.56MHz(Optional)
Volume 30L
Power 0~500W(Adjustable)
Cavity size(mm) 300*300*300
Layer 7
Overall size 650W*700D*1400H
Vacuum pump Oil pum/dry pump + Roots combination (Optional)
Vacuum degree 5~100Pa(Adjustable)
Material of capacity 316 stainless steel/imported aluminum alloy(Optional)
Gas flow control 0~500SCCM(MFC±2%)
Gas channel Two way(addability):Ar/N2/H2/CF4/O2
Plasma generator 40KHz/13.56MHz(Optional)
Tempture of capacity <30 degree
Control mode PLC+Touch screen
Software of system      control Independent
Electrode ceramic Imported high frequency ceramics


Features


1. Vacuum plasma cleaning machine chamber, power supply, vacuum pump and other accessories can be customized according to the actual cleaning materials. Compared with atmospheric plasma, it has the characteristics of free adjustment of cleaning process parameters, low temperature and comprehensive cleaning.


2. Widely used in activation, deplating, modification, etching, improving adhesion and cleaning and other functions.At present,it is the most environmental protection, the most energy saving, good effectiveness of the ideal equipment in the cleaning industry.


3. Main functions:

Etching: It is very useful for the removal of photoresist polyimide residues and coatings based on silicides.

Adhesion enhancement: adding chemical groups with strong activation ability to the matrix to improve the adhesion of the adhesive.

Cleaning: Removal of optical material contamination and removal of organic residues, oxidation and metal salts on the material contamination.

Activation: It can cause the surface of the substrate to form the required chemical polar bonds;

Deplating: Remove metal and other materials from the treated substrate to produce various products.


Product Application



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